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Porous Metal Oxide Films


06.01.2012
| Ref.Nr. 09068
Physics&Engineering

SEM image of a macroporous network (Sokolov, Paul, Krähnert. 2009)Background
Thin porous metal oxide films offer unique physical, electrical and magnetic properties with applications in various fields including catalysis, gas sensing and separation, power storage and generation as well as biology and medicine. Currently known synthesis techniques for metal oxide films with templated porosity (e.g. dip-coating, spin-coating) show significant limitations when they are faced with large substrates and/or substrates with a micro-structured surface.

Technology
We offer an improved method for the production of porous metal oxide films on a substrate using template assisted electrostatic spray deposition (ESD). It overcomes all known problems of current technologies like dip- and spin coating.This novel method is able to produce unisized mesoporous and macroporous films by directly controlling the size and concentration of the pore forming organic templates in an initially formed precursor solution.


IP Rights

PCT Application with priority on October 2009

Patent Owner
Technische Universität Berlin, Germany

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Application Area:
Catalysis, Sensors (gas sensors), (Dye sensitized) solar cells, Templates, Displays
Development Stage: Product
Schlagworte: Metal oxide, Pore, Porous,
Weitere Kategorien: Catalysis, Physics & Engineering
Bild des Benutzers Jeanne Trommer
Licensing Manager: Jeanne Trommer
T +49 30 2125 4831
F +49 30 2125 4822
Suitable Industry: Chemistry, Photovoltaic, Electronic, Optoelectronic
Benefits:

  • Hierarchically structured meso- and macroporous films
  • Control of pore morphology (volume, size, distribution, connectivity)
  • Pores can be coated with catalytic active material
  • Various substrates can be used
  • Coating of large substrates
  • Easy transfer to industrial applications
  • Production under room conditions

Highly Efficient Light Emitters - The Route to Green Lasers


25.08.2011
| Ref.Nr. 06094
Physics&Engineering
Background
The emission of green laser light is of great importance for several applications and procedures in biology, medicine and multimedia. A powerful green laser could revolutionize the market for portable beamers. So far, semiconductor based light emitters, such as laser pointers, convert infrared light by frequency doubling into green light. A significant drawback of this technique is the loss of power and efficiency.

Technology
We offer green light emitting semiconductor devices including for example a green laser. The use of ZnCdO as a semiconductor material allows direct emission of green light without frequency doubling.

IP Rights
German Patent Application

Patent Owner

Humboldt-Universität zu Berlin, Germany

Application Area:
Green lasers, Laser diodes
Development Stage: Demonstrator
Bild des Benutzers Dr. Kirk Haselton
Licensing Manager: Dr. Kirk Haselton
T +49 30 2125 4842
F +49 30 2125 4822
Benefits:
  • Direct Green light emission (band gap 2.2 eV - 2.5 eV)
  • No frequency doubling involved
  • No loss of efficiency
  • High degree of crystalline perfection
  • High stable semiconductor material
  • Small, low cost device

     

Terahertz Quantum Cascade Lasers


25.08.2011
| Ref.Nr. 09018
Physics&Engineering

Background
Quantum Cascade Lasers (QCLs) are currently the best electrically-pumped sources of Terahertz (THz) radiation regarding output power, linewidth, operating temperatures and efficiency. THz QCLs offer a wide field of applications ranging from astrophysics and security screening to ultrafast spectroscopy in chemistry or biology. For all these applications THz QCLs which can operate at moderate temperature are desired.

Technology
The invention offers a THz Quantum Cascade Laser with improved temperature performance. The THz QCL uses a strain-compensated (Al, Ga, In)As material grown on InP substrates.

IP Rights

PCT Application

Patent Owner
Humboldt-Universität zu Berlin, Germany
University of Texas, USA

Application Area:
Spectroscopy (Chemistry, Biochemistry, Astrophysics), Medical Imaging, Detectors, Sensors
Development Stage: Concept
Bild des Benutzers Dr. Kirk Haselton
Licensing Manager: Dr. Kirk Haselton
T +49 30 2125 4842
F +49 30 2125 4822
Suitable Industry: Security Industry, Chemical Industry, Medical Industry
Benefits:
  • Operating frequencies: 0.8 THz - 5 THz
  • Operating temperature: 240K minimum
  • Operating temperature can be achieved using thermoelectric coolers
  • Improved laser gain compared to common THz QCLs

     

Catalytic Nano-Pen for Cutting Graphene


25.08.2011
| Ref.Nr. 08133
Physics&Engineering

Scheme (left) and scanning tunneling microscope (STM) image of a graphene trench made by the catalytic nano-pen Background
Graphene, a monoatomic layer of graphite, is a promising candidate for future (nano)electronic applications. Currently however there are no techniques available for reproducibly cutting graphene with nanometer precision.

Technology
We provide a catalytic Nano-Pen for high speed trench channeling of mono- and multilayer graphene using silver nanoparticles in an ambient environment and at elevated temperatures. A silver nanoparticle located at a graphene edge catalyzes oxidation of neighboring carbon atoms, thereby burning a trench into the graphene layer.

IP Rights
German Patent DE102008053691B3
US Patent Application

Patent Owner
Humboldt-Universität zu Berlin, Germany

Application Area:
Transparent and flexible electrodes, Flexible Solar cells, Flexible displays, Transistors, Memories
Development Stage: Proof of Concept
Schlagworte: Carbon, Graphene, Lithography,
Weitere Kategorien: Catalysis, Physics & Engineering
Bild des Benutzers Dr. Kirk Haselton
Licensing Manager: Dr. Kirk Haselton
T +49 30 2125 4842
F +49 30 2125 4822
Suitable Industry: (Nano)electronic, Optoelectronic, Consumer Electronic
Benefits:
  • high-precision lithography on graphene
  • cutting of smooth trenches (peak-to-peak roughness below 2 nm)
  • cutting speeds up to 250 nm/s
  • Environmentally friendly (gold or silver as catalytic material)
  • User friendly (transfer pattern directly from computer to graphene layer)
  • Economically priced (no need for complex high-vacuum installations as is required for electron beam lithography)

Quantum well structure


25.08.2011
| Ref.Nr. 03037
Physics&Engineering

Background
Quantum-well inter-subband devices, such as quantum-well infrared photo-detectors (QWIPs) and quantum cascade lasers (QCLs) are ideal for a variety of ground and space-based applications. Night vision, early warning systems, navigation, flight control systems, weather monitoring, security and surveillance are among the different applications based on QWIPs. QCLs are ideal candidates for the remote sensing of gases in the atmosphere.

Technology
The invention is a quantum well structure including a quantum well layer arranged between two barrier layers. The invention further refers to quantum well photodetectors and quantum cascade laser. 

IP Rights
German Patent DE 103 35 443 B4
US Patent US 7,893,425 B2
European Patent Application

Patent Owner
Humboldt-Universität zu Berlin, Germany

 

Application Area:
Mid-IR Spectroscopic applications, Quantum cascade laser, Quantum-well infrared photodetectors
Development Stage: Prototype
Bild des Benutzers Dr. Kirk Haselton
Licensing Manager: Dr. Kirk Haselton
T +49 30 2125 4842
F +49 30 2125 4822
Market Potential: Security industry, Environmental industry
Benefits:

  • Vertical detection or emission of photons
  • Improved coupling of light into or out of the device
  • High sheet densities
  • Precise control over the subband energies
  • No restrictions on the quantum-well thickness
  • Flexibility in structural design

Single or Entangled Photon Source


25.08.2011
| Ref.Nr. 05128
Physics&Engineering

Background
For high security quantum cryptography electrically triggered single or entangled photon sources are needed. In addition the mass market requires efficient, electrically driven, high-speed devices.

Technology
Common growth and processing techniques are used to fabricate single photon sources which either generate polarization entangled photon pairs or polarization controlled single photons. This offers the opportunity for quantum cryptography with single photons or entangled photon pairs. 

IP Rights
German Patent DE 102005057800 B4
European/ US/ Japanese Patent Application

Patent Owner

Technische Universität Berlin, Germany

Application Area:
Quantum cryptography
Development Stage: Lab Level
Bild des Benutzers Dr. Kirk Haselton
Licensing Manager: Dr. Kirk Haselton
T +49 30 2125 4842
F +49 30 2125 4822
Suitable Industry: Security Industry, Communication, Information Technology
Benefits:

  • Choice of electrically triggered entangled or single photon source
  • Thermo-electrical cooling
  • Mass production possible

Photon Pair source


25.08.2011
| Ref.Nr. 08112
Physics&Engineering

Figure showing a photon pair source (left) and the (111) substrate orientation (right) Background
For high security quantum cryptography electrically triggered single or entangled photon sources are needed. In addition the mass market requires efficient, electrically driven, high-speed devices. A single or entangled photon source allows to use common growth and processing techniques for fabrication.

Technology
We offer a method for producing a photon pair source, which generates entangled photon pairs. This method offers a minimization of the fine structure splitting in Quantum Dots (QDs) to nearly zero using (1,1,1)-orientated semiconductor substrates.

IP Rights
German Patent DE 102008036400 B3
European / Japanese/ Chinese/ Indian/ Korean Patent Application

Patent Owner
Technische Universität Berlin, Germany

Application Area:
Quantum cryptography
Development Stage: Concept
Bild des Benutzers Dr. Kirk Haselton
Licensing Manager: Dr. Kirk Haselton
T +49 30 2125 4842
F +49 30 2125 4822
Suitable Industry: Security Industry, Communication, Information Technology
Benefits:

  • Compact photon pair source
  • High repetition rate
  • Produces photons on-demand

Memory Cell for Data storage


25.08.2011
| Ref.Nr. 11017
Physics&Engineering

Background
Non-volatile Flash memories can store data for years without refreshing, but write information about 1000 times slower than volatile dynamic random access memories (DRAMs).

Technology
The invention is a semiconductor heterostructure (quantum dot) based memory cell, in which the writing process is based on hole or electron storage and the erasing process is due to the recombination of electrons and holes. This memory cell can be switched between electron and hole storage and used as binary storage element.

IP Rights

German Patent Application 2011

Patent Owner

Technische Universität Berlin, Germany

 

Application Area:
Data storage, Memory cell for optoelectronic devices
Development Stage: Concept
Schlagworte: Memory Cell, Quantum Dots,
Bild des Benutzers Dr. Kirk Haselton
Licensing Manager: Dr. Kirk Haselton
T +49 30 2125 4842
F +49 30 2125 4822
Suitable Industry: Computer Industry, Optoelectronic, Consumer Electronics
Benefits:
  • Long-term data storage
  • High read/write speed
  • Low write/erase voltage (less than 2 V)

Quantum Dot Array


25.08.2011
| Ref.Nr. 10017
Physics&Engineering

Scheme illustrating the fabrication process to form quantum dot arrays or single quantum dotsBackground
Quantum dot (QD) arrays are attractive for a wide range of applications in nanoelectronics, optoelectronics and photovoltaics.

Technology
This technique is used to form large-area, highly uniform and ordered quantum dot arrays using the combination of nanoimprint lithography (NIL) and an etching step to form nanoholes followed by growing the quantum dots with metal organic chemical vapor deposition (MOCVD). Quantum dot arrays with high and low density structures as well as single QDs at predefined positions can be fabricated.

IP Rights

US Patent Application April 2010
PCT Application

Patent Owner

Technische Universität, Germany

 

Application Area:
All QD based devices, Quantum cryptography, Single-photon emitters /transistors
Development Stage: Proof of Concept, Demonstration
Bild des Benutzers Dr. Kirk Haselton
Licensing Manager: Dr. Kirk Haselton
T +49 30 2125 4842
F +49 30 2125 4822
Suitable Industry: Semiconductor/Computer/Security Industry, Consumer Electronics, Communication/Information Technology
Benefits:
  • Large area QD arrays
  • Highly uniform and regularly ordered QD arrays
  • High throughput
  • Low cost technique
  • Ability for mass production

     

Memory Cell for Data Storage


25.08.2011
| Ref.Nr. 06125
Physics&Engineering

Figure showing the a) writing b) erasing and c) storing process in a QD based memory cellBackground
The most important factors for computer storage are: read/write speeds, storage density, endurance, reliability, and cost. DRAMs are short-term memories with high speed but the data must be refreshed over 100 times per second to maintain its memory. Flash memory can store data for years without refreshing, but writes information about 1000 times slower than DRAM.


Technology

The invention is a semiconductor nanostructure based non-volatile memory cell that can provide the best of both DRAM and flash memory: long term storage with write speeds nearly as fast as DRAM. One difference from normal flash memory is varying the barrier height by changing the bias on the depletion region, enabling either retention or insertion of charge into the QD. A further difference is growing the QDs in the depletion region of a p-n junction, so that holes are stored in the QDs. Charge removal is achieved by using tunneling. The read mechanism is similar to that of flash memory.

IP Rights
US Patent US 7,948,822 B2

European Patent EP 2097904 B1
German/ Japanese/ Korean/ Patent Application

Patent Owner

Technische Universität Berlin, Germany

Application Area:
Data storage, Memory cell
Development Stage: Concept
Bild des Benutzers Dr. Kirk Haselton
Licensing Manager: Dr. Kirk Haselton
T +49 30 2125 4842
F +49 30 2125 4822
Suitable Industry: Computer Industry, Consumer Electronics
Benefits:

  • High read/write speed
  • Long-term reliability