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Porous Metal Oxide Films


06.01.2012 | Ref.Nr. 09068
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Physics&Engineering

SEM image of a macroporous network (Sokolov, Paul, Krähnert. 2009)Background
Thin porous metal oxide films offer unique physical, electrical and magnetic properties with applications in various fields including catalysis, gas sensing and separation, power storage and generation as well as biology and medicine. Currently known synthesis techniques for metal oxide films with templated porosity (e.g. dip-coating, spin-coating) show significant limitations when they are faced with large substrates and/or substrates with a micro-structured surface.

Technology
We offer an improved method for the production of porous metal oxide films on a substrate using template assisted electrostatic spray deposition (ESD). It overcomes all known problems of current technologies like dip- and spin coating.This novel method is able to produce unisized mesoporous and macroporous films by directly controlling the size and concentration of the pore forming organic templates in an initially formed precursor solution.


IP Rights
PCT Application with priority on October 2009

Patent Owner
Technische Universität Berlin, Germany

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Application Area:
Catalysis, Sensors (gas sensors), (Dye sensitized) solar cells, Templates, Displays
Development Stage: Product
Schlagworte: Metal oxide, Pore, Porous,
Weitere Kategorien: Catalysis, Physics & Engineering
Bild des Benutzers Jeanne Trommer
Licensing Manager: Jeanne Trommer
T +49 30 2125 4831
F +49 30 2125 4822
jeanne.trommer@ipal.de
Suitable Industry: Chemistry, Photovoltaic, Electronic, Optoelectronic
Benefits:

  • Hierarchically structured meso- and macroporous films
  • Control of pore morphology (volume, size, distribution, connectivity)
  • Pores can be coated with catalytic active material
  • Various substrates can be used
  • Coating of large substrates
  • Easy transfer to industrial applications
  • Production under room conditions

Catalytic Nano-Pen for Cutting Graphene


25.08.2011 | Ref.Nr. 08133
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Physics&Engineering

Scheme (left) and scanning tunneling microscope (STM) image of a graphene trench made by the catalytic nano-pen Background
Graphene, a monoatomic layer of graphite, is a promising candidate for future (nano)electronic applications. Currently however there are no techniques available for reproducibly cutting graphene with nanometer precision.

Technology
We provide a catalytic Nano-Pen for high speed trench channeling of mono- and multilayer graphene using silver nanoparticles in an ambient environment and at elevated temperatures. A silver nanoparticle located at a graphene edge catalyzes oxidation of neighboring carbon atoms, thereby burning a trench into the graphene layer.

IP Rights
German Patent DE102008053691B3
US Patent Application

Patent Owner
Humboldt-Universität zu Berlin, Germany

Application Area:
Transparent and flexible electrodes, Flexible Solar cells, Flexible displays, Transistors, Memories
Development Stage: Proof of Concept
Schlagworte: Carbon, Graphene, Lithography,
Weitere Kategorien: Catalysis, Physics & Engineering
Bild des Benutzers Dr. Kirk Haselton
Licensing Manager: Dr. Kirk Haselton
T +49 30 2125 4842
F +49 30 2125 4822
kirk.haselton@ipal.de
Suitable Industry: (Nano)electronic, Optoelectronic, Consumer Electronic
Benefits:
  • high-precision lithography on graphene
  • cutting of smooth trenches (peak-to-peak roughness below 2 nm)
  • cutting speeds up to 250 nm/s
  • Environmentally friendly (gold or silver as catalytic material)
  • User friendly (transfer pattern directly from computer to graphene layer)
  • Economically priced (no need for complex high-vacuum installations as is required for electron beam lithography)